Features:
Current approaches for nano-lithography -- such as Laser beam lithography, Near field lithography, or E-beam lithography -- are all expensive and require large areas. Now these can be replaced by Visible Light Laser Direct Writing Technology.
ITRI has developed the new technology of Nano-scale Visible Light Laser Direct Writing and a patented thermal lithography material. It simplifies the complex conventional nano scale fabrication down to only 5 processes.
Visible Light Laser Direct Writing
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