This is an animation that shows a side by side comparison of a wet oxidation process vs. a dry oxidation process. Both processes use an oxygen source to grow silicon dioxide (SiO2) on a silicon wafer heated furnace. Wet thermal oxidation uses water vapor. Dry thermal oxidation uses oxygen gas. Watch the animation and identify the differences in these two processes. These processes are discussed in the Deposition Overview for MEMS Learning Module which can be viewed and downloaded at http://scme-nm.org/i
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